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ON4744 Specifications

Detailed technical information and Application Scenarios

Product Details

PartNumberManufactorQuantityAvailability
ON4744PHI100Yes

Manufacturer:** PHI (Physical Electronics) **Part Number:** ON4744 ### **Specifications:** - **Type:** Ion Gun (for surface analysis applications) - **Energy Range:** Typically 0.

Manufacturer: PHI (Physical Electronics)

Part Number: ON4744

Specifications:

  • Type: Ion Gun (for surface analysis applications)
  • Energy Range: Typically 0.5 keV to 5 keV (adjustable)
  • Beam Current: Adjustable, typically in the range of microamperes (µA)
  • Beam Diameter: Variable, depending on focusing and energy settings
  • Gas Options: Supports inert gases (e.g., Ar⁺) or reactive gases (e.g., O₂⁺) for sputtering
  • Applications: Used in surface cleaning, depth profiling, and ion milling in XPS (XPS), AES, and SIMS systems.

Descriptions:

The ON4744 is an ion gun designed for precision surface modification and depth profiling in ultra-high vacuum (UHV) analytical systems. It provides a stable, focused ion beam for controlled material removal or surface preparation.

Features:

  • Adjustable Energy & Current: Allows fine-tuning for different analytical requirements.
  • High Stability: Ensures consistent performance during long-duration experiments.
  • Compatibility: Designed for integration with PHI’s XPS and AES instruments.
  • Precision Focusing: Enables localized sputtering for high-resolution depth profiling.
  • UHV-Compatible: Constructed for operation in ultra-high vacuum environments.

For exact operational parameters, refer to the manufacturer’s datasheet.

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